Author Details

Чесноков, И.

Issue	Section	Title	File
Vol 53, No 4 (2024)	ТЕХНОЛОГИИ	Plasmochemical and Reactive Ion Etching of Gallium Arsenide in Difluorodichloromethane with Helium
Vol 53, No 3 (2024)	ДИАГНОСТИКА	Influence of Hydrogen Additive on Electrophysical Parameters and Emission Spectra of Tetrafluoromethane Plasma
Vol 52, No 6 (2023)	ДИАГНОСТИКА	PROBE AND SPECTRAL DIAGNOSTICS OF PLASMA GAS ENVIRONMENT: BCl3-Cl2
Vol 52, No 5 (2023)	ДИАГНОСТИКА	Electrophysical Parameters and Emission Spectra of the Glow Discharge of Difluorodichloromethane
Vol 52, No 1 (2023)	ДИАГНОСТИКА	Controlling Silicon Etching Parameters in RF CHF3 Plasma by Optical Emission Spectroscopy
Vol 52, No 1 (2023)	ДИАГНОСТИКА	Электрофизические характеристики и эмиссионные спектры плазмы тетрафторметана